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Retardation of dopant diffusion
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"Retardation of dopant diffusion"
A Stacked Polusilicon Strucutre by Nitridation in N2 Atmosphere for Nano-scale CMOSFETs
J Korean Inst Electr Electron Mater Eng
2005;18(11):1001-1006.
Published online November 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.11.1001
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