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"SOM"

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"SOM"

Thin Films and Sensors : Regular Paper ; Phase Transition Properties of Ferroelectric Polymer Films
Chul Woo Park, Chi Sup Jung
J Electr Electron Mater 2014;27(2):97-103.   Published online February 1, 2014
Phase transition properties of the copolymer films of polyvinylidene fluoride (PVDF) and trifluoroethylene(TrFE), P(VDF-TrFE), were studied with X-ray diffraction (XRD) and polarization modulated ellipsometry (PME). XRD studies on both Langmuir-Blodgett (LB) films and spin coated films exhibit conversions from ferroelectric phase to paraelectric phase at 108±2℃ on heating and paraelectric phase to ferroelectric phase at 78±2℃ on cooling. The presence of the ferroelectric-paraelectric phase transition is also confirmed by the PME technique for the first time in this study. PME was proved to be a very sensitive tool in the measurement of the structural changes at the nano-thickness films.
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Energy Materials : Effect of Hydrogen Dilution Ratio on The Si Hetero-junction Interface and Its Application to Solar Cells
Ga Won Lee, Jun Hyoung Park, Seung Yeop Myoung
J Electr Electron Mater 2012;25(12):1009-1014.   Published online December 1, 2012
Hydrogenated amorphous silicon (а-Si:H) layers deposited by plasma enhanced chemical vapor deposition (PECVD) are investigated for use in silicon hetero-junction solar cells employing n-type crystalline silicon (c-Si) substrates. The optical and structural properties of silicon hetero-junction devices have been characterized using spectroscopy ellipsometry and high resolution cross-sectional transmission electron micrograph (HRTEM). In addition, the effective carrier lifetime is measured by the quasi-steady-state photocoductance (QSSPC) method. We have studied on the correlation between the order of а-Si:H and the passivation quality at the interface of а-Si:H/c-Si. Base on the result, we have fabricated a silicon hetero-junction solar cell incorporating the а-Si:H passivation layer with on open circuit voltage (Voc) of 637 mV.
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A Study of Optical Characteristics Correlated With Low Dielectric Constant of SiOCH Thin Films Through Ellipsometry
Yong Heon Park
J Electr Electron Mater 2010;23(3):228-233.   Published online March 1, 2010
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A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry
In Hwan Yi, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(12):1083-1089.   Published online December 1, 2008
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High Voltage Engineering : Comparison of BP and SOM as a Classification of PD Source
J Electr Electron Mater 2004;17(9):1006-1012.   Published online September 1, 2004
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