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SPM
WHERE t1.sid in(parameter_dbtbl_keyword '%SPM%') and t1.xml_status <> 99
6
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"SPM"
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Keywords
SPM (5)
AFM (2)
Contact angle (2)
MEMS (2)
Nano-scaled memory (2)
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2010 (1)
2009 (1)
2008 (1)
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Authors
Sung Chae Yang (3)
Wook Cho (1)
Byoung Jung Choi (1)
Young Gi Kim (1)
Sang Min Yun (1)
Keywords
SPM (5)
AFM (2)
Contact angle (2)
MEMS (2)
Nano-scaled memory (2)
Scanning plasma method (2)
Thermal probe array (2)
Cable joint (1)
CF4 plasma (1)
Diamond-Like carbon (1)
DLC (1)
EPDM (1)
E×B drift (1)
Large-area uniform (1)
Low temperature process (1)
Partial discharge (1)
PET film (1)
SPMD (1)
Void and copper defects (1)
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Byoung Jung Choi (1)
Young Gi Kim (1)
Sang Min Yun (1)
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"SPM"
Control of Contact Angle by Surface Treatment using Sanning Plasma Method
Young Gi Kim, Byoung Jung Choi, Sung Chae Yang
J Korean Inst Electr Electron Mater Eng
2010;23(1):10-13.
Published online January 1, 2010
DOI:
https://doi.org/10.4313/JKEM.2010.23.1.010
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Large-area Uniform Deposition of Amorphous Hydrogenated Carbon Films using a Plasma CVD Method
Sang Min Yun, Sung Chae Yang
J Korean Inst Electr Electron Mater Eng
2009;22(5):411-414.
Published online May 1, 2009
DOI:
https://doi.org/10.4313/JKEM.2009.22.5.411
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36
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Plasma surface Treatment of the Polymeric Film with Low Temperature Process
Wook Cho, Sung Chae Yang
J Korean Inst Electr Electron Mater Eng
2008;21(5):486-491.
Published online May 1, 2008
DOI:
https://doi.org/10.4313/JKEM.2008.21.5.486
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Citations
Citations to this article as recorded by
Improvement of Wettability and Removal of Skin Layer on Ar-Plasma-Treated Polypropylene Blend Surface
Jong-Il Weon, Sun-Yong Lee
Polymer Korea.2012; 36(4): 461.
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Partial Discharge Characteristics of the XLPE/EPDM Interface in Power Cable Joint
J Korean Inst Electr Electron Mater Eng
2007;20(9):780-786.
Published online September 1, 2007
DOI:
https://doi.org/10.4313/JKEM.2007.20.9.780
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Fabrication and Characterization of 32×32 Silicon Cantilever Array using MEMS Process
J Korean Inst Electr Electron Mater Eng
2006;19(10):894-900.
Published online October 1, 2006
DOI:
https://doi.org/10.4313/JKEM.2006.19.10.894
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Fabrication and Characterization of Thermal Probe Array on SOI Substrates
J Korean Inst Electr Electron Mater Eng
2005;18(11):990-995.
Published online November 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.11.990
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34
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