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"Tunnel barrier engineering"

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"Tunnel barrier engineering"

Improved Electrical Characteristics of Symmetrical Tunneling Dielectrics Stacked with SiO2 and Si3N4 Layers by Annealing Processes for Non-volatile Memory Applications
Min Soo Kim, Myung Ho Jung, Kwan Su Kim, Goon Ho Park, Jong Wan Jung, Hong Bay Chung, Young Hie Lee, Won Ju Cho
J Electr Electron Mater 2009;22(5):386-389.   Published online May 1, 2009
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