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"Within wafer non-uniformity"

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"Within wafer non-uniformity"

Effect of Pad Surface Characteristics on Within Wafer Non-uniformity in CMP
J Korean Inst Electr Electron Mater Eng 2006;19(4):309-313.   Published online April 1, 2006
DOI: https://doi.org/10.4313/JKEM.2006.19.4.309
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A Study on the Within Wafer Non-uniformity of Oxide Film in CMP
J Korean Inst Electr Electron Mater Eng 2005;18(6):521-526.   Published online June 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.6.521
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