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반도체 / 13-2-7 / 실리콘 웨이퍼위에 증착된 실리케이트 산화막의 CMP 슬러리 오염 특성

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CMP Slurry Induction Properties of Silicate Oxides Deposited on Silicon Wafer

Sang Yong Kim, Yong Jin Seo, Woo Sun Lee, Eui Goo Jang
J Korean Inst Electr Electron Mater Eng 2000;13(2):131-136.
Published online: February 1, 2000
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CMP Slurry Induction Properties of Silicate Oxides Deposited on Silicon Wafer
J Korean Inst Electr Electron Mater Eng. 2000;13(2):131-136.   Published online February 1, 2000
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CMP Slurry Induction Properties of Silicate Oxides Deposited on Silicon Wafer
J Korean Inst Electr Electron Mater Eng. 2000;13(2):131-136.   Published online February 1, 2000
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