A study on etching mechanism of SBT thin film by using Ar/CHF3 plasma

Jung Woo Seo; Won Jae Lee; Byong Gon Yu; Eui Goo Chang; Chang Il Kim

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반도체 / Ar/CHF3 플라즈마를 이용한 SBT 박막에 대한 식각 메카니즘 연구

서정우, 이원재, 유병곤, 장의구, 김창일

A study on etching mechanism of SBT thin film by using Ar/CHF3 plasma

Jung Woo Seo, Won Jae Lee, Byong Gon Yu, Eui Goo Chang, Chang Il Kim

J Electr Electron Mater 2000;13(3):183-187.
Published online: March 1, 2000

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A study on etching mechanism of SBT thin film by using Ar/CHF3 plasma

J Electr Electron Mater. 2000;13(3):183-187. Published online March 1, 2000

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A study on etching mechanism of SBT thin film by using Ar/CHF3 plasma

J Electr Electron Mater. 2000;13(3):183-187. Published online March 1, 2000

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반도체 / Ar/CHF3 플라즈마를 이용한 SBT 박막에 대한 식각 메카니즘 연구

A study on etching mechanism of SBT thin film by using Ar/CHF3 plasma

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