V-I Characteristics of SCT Thin Film by RF Sputtering Method

J . S . Kim; C . N . Cho; C . G . Shin; W . S . Choi; C . H . Kim; J . U . Lee

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RF 스퍼터링법에 의한 SCT 박막의 전압 - 전류 특성

김진사, 조춘남, 신철기, 최운식, 김충혁, 이준웅

V-I Characteristics of SCT Thin Film by RF Sputtering Method

J . S . Kim, C . N . Cho, C . G . Shin, W . S . Choi, C . H . Kim, J . U . Lee

J Electr Electron Mater 2000;13(9):745-750.
Published online: September 1, 2000

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V-I Characteristics of SCT Thin Film by RF Sputtering Method

J Electr Electron Mater. 2000;13(9):745-750. Published online September 1, 2000

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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bib — For JabRef, BibDesk, and other BibTeX-specific software

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V-I Characteristics of SCT Thin Film by RF Sputtering Method

J Electr Electron Mater. 2000;13(9):745-750. Published online September 1, 2000

Articles

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RF 스퍼터링법에 의한 SCT 박막의 전압 - 전류 특성

V-I Characteristics of SCT Thin Film by RF Sputtering Method

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