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반도체 : 유도결합 플라즈마를 이용한 YMnO3 박막의 건식 식각 특성 연구

민병준, 김창일, 장의구

Dry Etching Characteristics of YmnO3 Thin Films Using Inductively Coupled Plasma

Byung Jun Min, Chang Il Kim, Eui Goo Chang
J Korean Inst Electr Electron Mater Eng 2001;14(2):93-98.
Published online: February 1, 2001
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Dry Etching Characteristics of YmnO3 Thin Films Using Inductively Coupled Plasma
J Korean Inst Electr Electron Mater Eng. 2001;14(2):93-98.   Published online February 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Dry Etching Characteristics of YmnO3 Thin Films Using Inductively Coupled Plasma
J Korean Inst Electr Electron Mater Eng. 2001;14(2):93-98.   Published online February 1, 2001
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