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반도체 : 유도결합 플라즈마를 이용한 YMnO3 박막의 건식 식각 특성 연구

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Dry Etching Characteristics of YmnO3 Thin Films Using Inductively Coupled Plasma

Byung Jun Min, Chang Il Kim, Eui Goo Chang
J Electr Electron Mater 2001;14(2):93-98.
Published online: February 1, 2001
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Dry Etching Characteristics of YmnO3 Thin Films Using Inductively Coupled Plasma
J Electr Electron Mater. 2001;14(2):93-98.   Published online February 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Dry Etching Characteristics of YmnO3 Thin Films Using Inductively Coupled Plasma
J Electr Electron Mater. 2001;14(2):93-98.   Published online February 1, 2001
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