Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

CI2/O2 가스에 의한 크롬 박막의 식각 특성 고찰

박희찬, 강승열, 이상균, 최복길, 권광호

The Etching Characteristics of Cr Films by Using CI2/ O2 Gas Mixtures

Hee Chan Park, Seung Youl Kang, Sang Kyun Lee, Bok Gll Choi, Kwang Ho Kwon
J Electr Electron Mater 2001;14(8):634-639.
Published online: August 1, 2001
  • 4 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

The Etching Characteristics of Cr Films by Using CI2/ O2 Gas Mixtures
J Electr Electron Mater. 2001;14(8):634-639.   Published online August 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
The Etching Characteristics of Cr Films by Using CI2/ O2 Gas Mixtures
J Electr Electron Mater. 2001;14(8):634-639.   Published online August 1, 2001
Close