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CF4/Gas Chemistry에 의해 식각된 Ru 박막의 표면 반응

임규태, 김동표, 김경태, 김창일, 최장현, 송준태

Surface Reaction of Ru Thin Films Etched in CF4/O2 Gas Chemistry

Kyu Tae Lim, Dong Pyo Kim, Kyoung Tae Kim, Chang Il Kim, Jang Hyun Choi, Joon Tae Song
J Korean Inst Electr Electron Mater Eng 2002;15(12):1016-1020.
Published online: December 1, 2002
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Surface Reaction of Ru Thin Films Etched in CF4/O2 Gas Chemistry
J Korean Inst Electr Electron Mater Eng. 2002;15(12):1016-1020.   Published online December 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.12.1016
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Surface Reaction of Ru Thin Films Etched in CF4/O2 Gas Chemistry
J Korean Inst Electr Electron Mater Eng. 2002;15(12):1016-1020.   Published online December 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.12.1016
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