Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma

Pil Seung Kang; Kyoung Tae Kim; Dong Pyo Kim; Chang Il Kim

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Ar/CF4 유도결합 플라즈마에서 식각된 (Ba0.6Sr0.4)TiO3 박막의 손상 감소

강필승, 김경태, 김동표, 김창일

Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma

Pil Seung Kang, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim

J Electr Electron Mater 2003;16(6):460-464.
Published online: June 1, 2003

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Keywords: BST, Sol-Gel, ICP, XPS, AFM

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Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma

J Electr Electron Mater. 2003;16(6):460-464. Published online June 1, 2003

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Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma

J Electr Electron Mater. 2003;16(6):460-464. Published online June 1, 2003

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Ar/CF4 유도결합 플라즈마에서 식각된 (Ba0.6Sr0.4)TiO3 박막의 손상 감소

Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma

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