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Ar/CF4 유도결합 플라즈마에서 식각된 (Ba0.6Sr0.4)TiO3 박막의 손상 감소

강필승, 김경태, 김동표, 김창일

Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma

Pil Seung Kang, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim
J Korean Inst Electr Electron Mater Eng 2003;16(6):460-464.
Published online: June 1, 2003
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Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma
J Korean Inst Electr Electron Mater Eng. 2003;16(6):460-464.   Published online June 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.6.460
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Study on Damage Reduction of (Ba0.6Sr0.4)TiO3 Thin Films in Ar/CF4 Plasma
J Korean Inst Electr Electron Mater Eng. 2003;16(6):460-464.   Published online June 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.6.460
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