Effects of Mixed Oxidizer on the W-CMP Characteristics

Chang Jun Park; Yong Jin Seo; Sang Yong Kim; U Seon Lee

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혼합 산화제가 W-CMP 특성에 미치는 영향

박창준, 서용진, 김상용, 이우선

Effects of Mixed Oxidizer on the W-CMP Characteristics

Chang Jun Park, Yong Jin Seo, Sang Yong Kim, U Seon Lee

J Electr Electron Mater 2003;16(12s):1181-1186.

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Keywords: Chemical Mechanical Polishing, CMP, Slurry, Oxidizer, Abrasive, Removal rate, RR, Non-uniformity, NU

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Effects of Mixed Oxidizer on the W-CMP Characteristics

J Electr Electron Mater. 2003;16(12s):1181-1186.

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Effects of Mixed Oxidizer on the W-CMP Characteristics

J Electr Electron Mater. 2003;16(12s):1181-1186.

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혼합 산화제가 W-CMP 특성에 미치는 영향

Effects of Mixed Oxidizer on the W-CMP Characteristics

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