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BCI3/Ne 혼합가스를 이용한 3-5 반도체의 고밀도 유도결합 플라즈마 식각

백인규, 임완태, 이제원, 조관식

High Density Inductively Coupled Plasma Etching of 3-5 Semiconductors in BCI3/Ne Chemistry

In Gyu Baeg, Wan Tae Im, Je Won Lee, Gwan Sig Jo
J Electr Electron Mater 2003;16(12s):1187-1194.
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High Density Inductively Coupled Plasma Etching of 3-5 Semiconductors in BCI3/Ne Chemistry
J Electr Electron Mater. 2003;16(12s):1187-1194.
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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High Density Inductively Coupled Plasma Etching of 3-5 Semiconductors in BCI3/Ne Chemistry
J Electr Electron Mater. 2003;16(12s):1187-1194.
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