Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

비대칭 마그네트론 스퍼터링법으로 성장된 a-C:H 의 물리적 특성

박용섭, 홍병유

Characteristics of Hydrogenated Amorphous Carbon (a-C:H) Thin Films Grown by Close Field UnBalanced Magnetron Sputtering Method

Yong Seob Park, Byeong Yu Hong
J Electr Electron Mater 2004;17(3):278-282.
Published online: March 1, 2004
  • 7 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Characteristics of Hydrogenated Amorphous Carbon (a-C:H) Thin Films Grown by Close Field UnBalanced Magnetron Sputtering Method
J Electr Electron Mater. 2004;17(3):278-282.   Published online March 1, 2004
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Characteristics of Hydrogenated Amorphous Carbon (a-C:H) Thin Films Grown by Close Field UnBalanced Magnetron Sputtering Method
J Electr Electron Mater. 2004;17(3):278-282.   Published online March 1, 2004
Close