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범용성 유도결합 플라즈마 식각장비를 이용한 깊은 실리콘 식각

조수범, 박세근, 오범환

The Development of Deep Silicon Etch Process with Conventional Inductively Coupled Plasma (ICP) Etcher

Soo Beom Jo, Se Geun Park, Beom Hoan O
J Electr Electron Mater 2004;17(7):701-707.
Published online: July 1, 2004
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The Development of Deep Silicon Etch Process with Conventional Inductively Coupled Plasma (ICP) Etcher
J Electr Electron Mater. 2004;17(7):701-707.   Published online July 1, 2004
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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The Development of Deep Silicon Etch Process with Conventional Inductively Coupled Plasma (ICP) Etcher
J Electr Electron Mater. 2004;17(7):701-707.   Published online July 1, 2004
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