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ICP 식각 시스템에 의한 초전도 스트립 라인의 임계 특성 분석

고석철, 강형곤, 최효상, 양성채, 한병성

Analysis of the Critical Characteristics in the Superconducting Strip Lines by ICP Etching System

Seok Cheol Ko, Hyeong Gon Kang, Hyo Sang Choi, Sung Chae Yang, Byoung Sung Han
J Electr Electron Mater 2004;17(7):782-787.
Published online: July 1, 2004
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Analysis of the Critical Characteristics in the Superconducting Strip Lines by ICP Etching System
J Electr Electron Mater. 2004;17(7):782-787.   Published online July 1, 2004
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Analysis of the Critical Characteristics in the Superconducting Strip Lines by ICP Etching System
J Electr Electron Mater. 2004;17(7):782-787.   Published online July 1, 2004
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