A Study on Oxidizer Effects in Tungsten CMP

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텅스텐 CMP에서 산화제 영향에 관한 연구

박범영, 이현섭, 박기현, 정석훈, 서헌덕, 정해도, 김호윤, 김형재

A Study on Oxidizer Effects in Tungsten CMP

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J Electr Electron Mater 2005;18(9):787-792.
Published online: September 1, 2005

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Keywords: Chemical mechanical polishing, Tungsten, Oxidizer, Catalyst, Removal rate

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A Study on Oxidizer Effects in Tungsten CMP

J Electr Electron Mater. 2005;18(9):787-792. Published online September 1, 2005

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A Study on Oxidizer Effects in Tungsten CMP

J Electr Electron Mater. 2005;18(9):787-792. Published online September 1, 2005

Study on Oxidation Resistance Characteristics of SiCN Thin Film

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텅스텐 CMP에서 산화제 영향에 관한 연구

A Study on Oxidizer Effects in Tungsten CMP

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