Effect of Ge Redistribution and Interdiffusion during Si(1-x)Gex Layer Dry Oxidation

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Si(1-x)Gex 층의 건식산화 동안 Ge 재 분포와 상호 확산의 영향

신창호, 이영훈, 송성해

Effect of Ge Redistribution and Interdiffusion during Si(1-x)Gex Layer Dry Oxidation

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J Electr Electron Mater 2005;18(12):1080-1086.
Published online: December 1, 2005

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Keywords: Ge redistribution, Ge interdiffusion, SiGe oxidation

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Effect of Ge Redistribution and Interdiffusion during Si(1-x)Gex Layer Dry Oxidation

J Electr Electron Mater. 2005;18(12):1080-1086. Published online December 1, 2005

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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bib — For JabRef, BibDesk, and other BibTeX-specific software

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Citation for the content below
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Effect of Ge Redistribution and Interdiffusion during Si(1-x)Gex Layer Dry Oxidation

J Electr Electron Mater. 2005;18(12):1080-1086. Published online December 1, 2005

Articles

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Si(1-x)Gex 층의 건식산화 동안 Ge 재 분포와 상호 확산의 영향

Effect of Ge Redistribution and Interdiffusion during Si(1-x)Gex Layer Dry Oxidation

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