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PECVD법에 의해 제조된 SnO2 박막의 공정변수에 따른 미세구조 및 특성

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Microstructure and Characterization Depending on Process Parameter of SnO2 Thin Films Fabricated by PECVD Method

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J Electr Electron Mater 2006;19(7):680-686.
Published online: July 1, 2006
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Microstructure and Characterization Depending on Process Parameter of SnO2 Thin Films Fabricated by PECVD Method
J Electr Electron Mater. 2006;19(7):680-686.   Published online July 1, 2006
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
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Microstructure and Characterization Depending on Process Parameter of SnO2 Thin Films Fabricated by PECVD Method
J Electr Electron Mater. 2006;19(7):680-686.   Published online July 1, 2006
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