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열처리 분위기에 따른 유로퓸 실리케이트 박막의 특성 변화

김은홍, 신영철, 임시종, 한철구, 김태근

Properly Changes of Europium-Silicate Thin Films depending on the Ambient Gas

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J Korean Inst Electr Electron Mater Eng 2007;20(3):263-267.
Published online: March 1, 2007
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Properly Changes of Europium-Silicate Thin Films depending on the Ambient Gas
J Korean Inst Electr Electron Mater Eng. 2007;20(3):263-267.   Published online March 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.3.263
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
Properly Changes of Europium-Silicate Thin Films depending on the Ambient Gas
J Korean Inst Electr Electron Mater Eng. 2007;20(3):263-267.   Published online March 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.3.263
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