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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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CMOS 공정을 이용한 2차원 SSIMT의 특성

송윤귀, 류지구

Characteristics of the 2-D SSIMT using a CMOS Process

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J Electr Electron Mater 2007;20(8):697-700.
Published online: August 1, 2007
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Characteristics of the 2-D SSIMT using a CMOS Process
J Electr Electron Mater. 2007;20(8):697-700.   Published online August 1, 2007
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Characteristics of the 2-D SSIMT using a CMOS Process
J Electr Electron Mater. 2007;20(8):697-700.   Published online August 1, 2007
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