Stability and Improvement of Polishing Pad in W CMP

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W CMP 공정에서의 연마패드표면 안정화 상태와 그 개선

박재흥, 키노시타마사하루, 요시다코이치, 신이치마츠무라, 정해도

Stability and Improvement of Polishing Pad in W CMP

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J Electr Electron Mater 2007;20(12):1027-1033.
Published online: December 1, 2007

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Keywords: Dressor, Conditioning, Break-In, Wettability, Zeta potential, CMP

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Stability and Improvement of Polishing Pad in W CMP

J Electr Electron Mater. 2007;20(12):1027-1033. Published online December 1, 2007

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Stability and Improvement of Polishing Pad in W CMP

J Electr Electron Mater. 2007;20(12):1027-1033. Published online December 1, 2007

Articles

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W CMP 공정에서의 연마패드표면 안정화 상태와 그 개선

Stability and Improvement of Polishing Pad in W CMP

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