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기판의 왕복 운동을 이용한 인라인 식각세정장치 내 ITO 식각특성

홍성재, 권상직, 조의식

ITO Wet Etch Properties in an In-Line Wet Etch,Cleaning System by using an Alternating Movement of Substrate

Sung Jae Hong, Sang Jik Kwon, Eou Sik Cho
J Electr Electron Mater 2008;21(8):715-718.
Published online: August 1, 2008
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ITO Wet Etch Properties in an In-Line Wet Etch,Cleaning System by using an Alternating Movement of Substrate
J Electr Electron Mater. 2008;21(8):715-718.   Published online August 1, 2008
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
ITO Wet Etch Properties in an In-Line Wet Etch,Cleaning System by using an Alternating Movement of Substrate
J Electr Electron Mater. 2008;21(8):715-718.   Published online August 1, 2008
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