Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

Plasma Etch Damage가 (100) SOI에 미치는 영향의 C-V 특성 분석

조영득, 김지홍, 조대형, 문병무, 조원주, 정홍배, 구상모

C-V Characterization of Plasma Etch-damage Effect on (100) SOI

Yeong Deuk Jo, Ji Hong Kim, Dae Hyung Cho, Byung Moo Moon, Won Ju Cho, Hong Bay Chung, Sang Mo Koo
J Electr Electron Mater 2008;21(8):711-714.
Published online: August 1, 2008
  • 8 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

C-V Characterization of Plasma Etch-damage Effect on (100) SOI
J Electr Electron Mater. 2008;21(8):711-714.   Published online August 1, 2008
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
C-V Characterization of Plasma Etch-damage Effect on (100) SOI
J Electr Electron Mater. 2008;21(8):711-714.   Published online August 1, 2008
Close

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.