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이중 이온주입 공정을 이용한 트렌치 필드링 설계 최적화 및 전기적 특성에 관한 연구

양성민, 오주현, 배영식, 성만영

The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices

Sung Min Yang, Ju Hyun Oh, Young Seok Bae, Man Young Sung
J Korean Inst Electr Electron Mater Eng 2010;23(5):364-367.
Published online: May 1, 2010
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The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices
J Korean Inst Electr Electron Mater Eng. 2010;23(5):364-367.   Published online May 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.5.364
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices
J Korean Inst Electr Electron Mater Eng. 2010;23(5):364-367.   Published online May 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.5.364
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