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이중 이온주입 공정을 이용한 트렌치 필드링 설계 최적화 및 전기적 특성에 관한 연구

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The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices

Sung Min Yang, Ju Hyun Oh, Young Seok Bae, Man Young Sung
J Electr Electron Mater 2010;23(5):364-367.
Published online: May 1, 2010
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The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices
J Electr Electron Mater. 2010;23(5):364-367.   Published online May 1, 2010
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
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The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices
J Electr Electron Mater. 2010;23(5):364-367.   Published online May 1, 2010
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