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4H-SiC 기반으로 제작된 MPS Diode의 Schottky 영역 비율에 따른 전기적 특성 분석

이형진, 강예환, 정승우, 이건희, 변동욱, 신명철, 양창헌, 구상모

Electrical Characteristics Analysis Depending on the Portion of MPS Diode Fabricated Based on 4H-SiC in Schottky Region

Hyung-jin Lee, Ye-hwan Kang, Seung-woo Jung, Geon-hee Lee, Dong-wook Byun, Myeong-choel Shin, Chang-heon Yang, Sang-mo Koo
J Electr Electron Mater 2022;35(3):241-245.
Published online: May 1, 2022
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In this study, we measured and comparatively analyzed the characteristics of MPS (Merged Pin Schottky) diodes in 4H-SiC by changing the areal ratio between the Schottky and PN junction region. Increasing the temperature from 298 K to 473 K resulted in the threshold voltage shifting from 0.8 V to 0.5 V. A wider Schottky region indicates a lower on-resistance and a faster turn-on. The effective barrier height was smaller for a wider Schottky region. Additionally, the depletion layer became smaller under the influence of the reduced effective barrier height. The wider Schottky region resulted in the ideality factor being reduced from 1.37 to 1.01, which is closer to an ideal device. The leakage saturation current increased with the widening Schottky region, resulting in a 1.38 times to 2.09 times larger leakage current.

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Electrical Characteristics Analysis Depending on the Portion of MPS Diode Fabricated Based on 4H-SiC in Schottky Region
J Electr Electron Mater. 2022;35(3):241-245.   Published online May 1, 2022
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Electrical Characteristics Analysis Depending on the Portion of MPS Diode Fabricated Based on 4H-SiC in Schottky Region
J Electr Electron Mater. 2022;35(3):241-245.   Published online May 1, 2022
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