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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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SiO2 막의 NH3 급속열처리에 의한 nitroxide 박막의 전기적특성

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Electrical Characteristics of Thin Nitroxide Films Prepared by NH3 Rapid Thermal Annealing of SiO2

Chan Won Park
J Electr Electron Mater 1990;3(2):105-114.
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Electrical Characteristics of Thin Nitroxide Films Prepared by NH3 Rapid Thermal Annealing of SiO2
J Electr Electron Mater. 1990;3(2):105-114.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Electrical Characteristics of Thin Nitroxide Films Prepared by NH3 Rapid Thermal Annealing of SiO2
J Electr Electron Mater. 1990;3(2):105-114.
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