Permittivity Characteristics of SiO / TiN Thin Film according to Coating Thickness

Chun Ock Chung; Byung In Kim; Woo Sun Lee; Chang Suk Kim

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SiO / TiN 박막의 증착두께에 따른 유전율 특성

김창석, 이우선, 정천옥, 김병인

Permittivity Characteristics of SiO / TiN Thin Film according to Coating Thickness

Chun Ock Chung, Byung In Kim, Woo Sun Lee, Chang Suk Kim

J Electr Electron Mater 1997;10(6):570-575.

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Permittivity Characteristics of SiO / TiN Thin Film according to Coating Thickness

J Electr Electron Mater. 1997;10(6):570-575.

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Permittivity Characteristics of SiO / TiN Thin Film according to Coating Thickness

J Electr Electron Mater. 1997;10(6):570-575.

Articles

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SiO / TiN 박막의 증착두께에 따른 유전율 특성

Permittivity Characteristics of SiO / TiN Thin Film according to Coating Thickness

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