Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

고주파 때려내기법에 의한 질화알루미늄 박막의 제작과 특성

정성훈, 김영호, 문동찬, 김선태

Preparation and characterization of AIN Thin Films by RF sputtering method

Sung Hoon Chung, Young Ho Kim, Dong Chan Moon, Seon Tai Kim
J Korean Inst Electr Electron Mater Eng 1997;10(7):706-712.
  • 15 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Preparation and characterization of AIN Thin Films by RF sputtering method
J Korean Inst Electr Electron Mater Eng. 1997;10(7):706-712.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Preparation and characterization of AIN Thin Films by RF sputtering method
J Korean Inst Electr Electron Mater Eng. 1997;10(7):706-712.
Close