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클로로포름 ( CHCl3) 을 첨가한 고농도 폴리실리콘 이방성 식각 기술

이정환, 서희돈, 최세곤

Anisotropic Etching Technology of Highly Doped Polysilicon by Mixed Chloroform

Jung Hwan Lee, Hee Don Seo, Se Gon Choi
J Electr Electron Mater 1998;11(2):101-105.
Published online: February 1, 1998
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Anisotropic Etching Technology of Highly Doped Polysilicon by Mixed Chloroform
J Electr Electron Mater. 1998;11(2):101-105.   Published online February 1, 1998
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Anisotropic Etching Technology of Highly Doped Polysilicon by Mixed Chloroform
J Electr Electron Mater. 1998;11(2):101-105.   Published online February 1, 1998
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