The R-V Characteristics of SiO2 & SiO2/TiN Thin Film Fabricated by RF Sputtering

Chang Suk Kim; Choong Ki Ha; Byung In Kim

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RF Sputtering 으로 제작한 SiO2 및 SiO2/TiN 박막의 R-V 특성

김창석, 하충기, 김병인

The R-V Characteristics of SiO2 & SiO2/TiN Thin Film Fabricated by RF Sputtering

Chang Suk Kim, Choong Ki Ha, Byung In Kim

J Electr Electron Mater 1998;11(10):826-832.
Published online: October 1, 1998

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The R-V Characteristics of SiO2 & SiO2/TiN Thin Film Fabricated by RF Sputtering

J Electr Electron Mater. 1998;11(10):826-832. Published online October 1, 1998

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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The R-V Characteristics of SiO2 & SiO2/TiN Thin Film Fabricated by RF Sputtering

J Electr Electron Mater. 1998;11(10):826-832. Published online October 1, 1998

Articles

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RF Sputtering 으로 제작한 SiO2 및 SiO2/TiN 박막의 R-V 특성

The R-V Characteristics of SiO2 & SiO2/TiN Thin Film Fabricated by RF Sputtering

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