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반도체 / Cu 와 Si 사이에서 확산 방지막으로 사용하기 위한 TiN/Zr(N)/TiN 다층박막의 연구

김창조, 조병철, 김좌연, 윤의중, 이재갑

A Study on TiN/Zr(N)/Tin Multilayer Films as a Diffusion Barrier between Cu and Si

Chang Jo Kim, Byung Chul Cho, Jwa Yeon Kim, Eui Jung Yun, Jae Gap Lee
J Electr Electron Mater 1999;12(8):663-671.
Published online: August 1, 1999
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A Study on TiN/Zr(N)/Tin Multilayer Films as a Diffusion Barrier between Cu and Si
J Electr Electron Mater. 1999;12(8):663-671.   Published online August 1, 1999
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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A Study on TiN/Zr(N)/Tin Multilayer Films as a Diffusion Barrier between Cu and Si
J Electr Electron Mater. 1999;12(8):663-671.   Published online August 1, 1999
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