Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

반도체 / 반응성 스퍼터링에 의한 AIN 박막의 증착 및 특성

김형택, 황지현, 정황희, 최성을, 박인호, 권명회

Deposition and Characteristics of AIN Tihn Films by Reactive Sputtering

Hyung Taek Kim, Ji Hyun Hwang, Hwang Hee Jung, Sung Eul Choi, In Ho Park, Myeung Hoi Kwon
J Korean Inst Electr Electron Mater Eng 1999;12(8):672-678.
Published online: August 1, 1999
  • 14 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Deposition and Characteristics of AIN Tihn Films by Reactive Sputtering
J Korean Inst Electr Electron Mater Eng. 1999;12(8):672-678.   Published online August 1, 1999
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
Deposition and Characteristics of AIN Tihn Films by Reactive Sputtering
J Korean Inst Electr Electron Mater Eng. 1999;12(8):672-678.   Published online August 1, 1999
Close

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.