Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

반도체 / 연마 시간 관계식을 이용한 STI CMP 의 특성에 관한 연구

김상용, 김남훈, 김창일, 장의구

A Study on Characteristics of STI CMP according to Polishing Time Correlation Equation

Sang Yong Kim, Nam Hoon Kim, Chang Il Kim, Eui Goo Chang
J Electr Electron Mater 1999;12(9):751-756.
Published online: September 1, 1999
  • 2 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

A Study on Characteristics of STI CMP according to Polishing Time Correlation Equation
J Electr Electron Mater. 1999;12(9):751-756.   Published online September 1, 1999
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
A Study on Characteristics of STI CMP according to Polishing Time Correlation Equation
J Electr Electron Mater. 1999;12(9):751-756.   Published online September 1, 1999
Close

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.