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Chemical mechanical polishing (2)
CMP (2)
LTCC (2)
Non-uniformity (2)
Removal rate (2)
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Keywords
Chemical mechanical polishing (2)
CMP (2)
LTCC (2)
Non-uniformity (2)
Removal rate (2)
Adhesion (1)
Alumina (1)
Annealing (1)
B2O3 (1)
Ba(Mg1/3Nb2/3)O3 (1)
Back pressure (1)
Bi12GeO20 single crystal (1)
Brewster angle microscope (1)
Channel Length (1)
Claming voltage (1)
Cu thin film (1)
CuO (1)
design of experiment (1)
Dielectric resonator (1)
DOE (1)
EBE (1)
Electro-optic effect (1)
Forward blocking characteristic (1)
Gel polymer electrolyte (1)
H3BO3-SnO (1)
Hydrophobicity (1)
Impurity concentration (1)
Ionic conductivity (1)
JFET (1)
Langmuir film (1)
Latch-up current (1)
Leakage current (1)
Lithium ion polymer battery (1)
MCT (1)
Microwave (1)
Microwave dielectric property (1)
Modeling (1)
Monomer (1)
Nonlinearity (1)
Ordering (1)
Oxygen octahedra tilting (1)
Plasma etching (1)
Polymer (1)
Polymer insulator (1)
Porcelain insulator (1)
Power arc test (1)
Power semiconductor (1)
PZT (1)
Quality factor (1)
Radial basis function network (1)
Refractive index (1)
Resistivity (1)
Resonance frequency (1)
Resonator (1)
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SIT (1)
Slurry (1)
Stability (1)
Steep front of wave flashover test (1)
Surface tension (1)
Surfactant (1)
Switching characteristics (1)
Temperature stability (1)
Thermal resisting property (1)
TiTe3O8 (1)
Tracking wheel test (1)
Trench oxide (1)
Triethylene glycol triacrylate (1)
Trimethylolpropane ethoxylate triacrylate (1)
Turntable and head speed (1)
Varistor (1)
WO3 (1)
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Previous issues
Volume 18(1); January 2005
Modeling of Plasma Etch Process using a Radial Basis Function Network
J Korean Inst Electr Electron Mater Eng
2005;18(1):1-5.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.001
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29
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A Study on the Electrical Characteristics in the Static Induction Transistor with Trench Oxide
J Korean Inst Electr Electron Mater Eng
2005;18(1):6-11.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.006
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38
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0
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Planarization Characteristics of CMP for WO3 Film with an Addition of Oxidizers
J Korean Inst Electr Electron Mater Eng
2005;18(1):12-16.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.012
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37
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0
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Switching Characteristics due to the Impurity Concentration and the Channel Length in Lateral MOS-controlled Thyristor
J Korean Inst Electr Electron Mater Eng
2005;18(1):17-23.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.017
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31
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0
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A Study on DOE Method to Optimize the Process Parameters for Cu CMP
J Korean Inst Electr Electron Mater Eng
2005;18(1):24-29.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.024
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37
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0
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Microwave Dielectric Characteristics of Ba(Mg1/3Nb2/3)O3-La(Mg2/3Nb1/3)O3 Ceramics with Crystal Structure
J Korean Inst Electr Electron Mater Eng
2005;18(1):30-37.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.030
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22
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Low-temperature Sintering and Microwave Dielectric Properties of the B2O3 and CuO-added Ba(Mg1/3Nb2/3)O3 Ceramics
J Korean Inst Electr Electron Mater Eng
2005;18(1):38-42.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.038
PDF
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Microwave Dielectric Properties of the LiNb3O8-TiO2 Ceramic System with the Addition of Low Firing Agents
Myung Ho Choi, Nam Chul Kim
Journal of Korean Institute of Electrical and Electronic Materials Engineers.2008; 21(6): 517.
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Improving Thermal Resisting Property of PZT Ceramics by Thermal Aging
J Korean Inst Electr Electron Mater Eng
2005;18(1):43-49.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.043
PDF
29
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0
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Electrical Properies, Clamping Voltage Characteristics, and Stability of Dysprosia-doped ZnO-Pr6O11-Based Varistors
J Korean Inst Electr Electron Mater Eng
2005;18(1):50-56.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.050
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33
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Microwave Dielectric Properties of 0.6TiTe3O8-0.4MgTiO3 Ceramics with Addition of H3BO3-SnO
J Korean Inst Electr Electron Mater Eng
2005;18(1):57-61.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.057
PDF
47
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0
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Tracking Performance Test of Polymer Insulator with Salt Solution which is added Surface Active Agent
J Korean Inst Electr Electron Mater Eng
2005;18(1):62-67.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.062
PDF
35
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0
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Optimization Study on Polymerization of Crosslink-type Gel Polymer Electrolyte for Lithium-ion Polymer Battery
J Korean Inst Electr Electron Mater Eng
2005;18(1):68-74.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.068
PDF
32
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The Resistivity Properties and Adhesive Strength of Cu Thin Firms Fabricated by EBE Method
J Korean Inst Electr Electron Mater Eng
2005;18(1):75-80.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.075
PDF
32
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The Surface Morphology of Polymer Langmuir Film
J Korean Inst Electr Electron Mater Eng
2005;18(1):81-88.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.081
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35
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Variation of the Representation Ellipsoid for Refractive Index of Bi12GeO20 Single Crystal by an Electric Field
J Korean Inst Electr Electron Mater Eng
2005;18(1):89-95.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.089
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27
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A Study on the Electric Performance of Porcelain Insulator with Al2O3 Addition in Transmission Line
J Korean Inst Electr Electron Mater Eng
2005;18(1):96-103.
Published online January 1, 2005
DOI:
https://doi.org/10.4313/JKEM.2005.18.1.096
PDF
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Deterioration of Porcelain Insulators Utilized in Overhead Transmission Lines: A Review
Simpy Sanyal, Fawad Aslam, Taeyong Kim, Seongho Jeon, Youn-Jung Lee, Junsin Yi, In-Hyuk Choi, Ju-Am Son, Ja-Bin Koo
Transactions on Electrical and Electronic Materials.2020; 21(1): 16.
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