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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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산화제 첨가에 따른 WO3 박막의 CMP 평탄화 특성

이우선, 고필주, 김남훈, 서용진

Planarization Characteristics of CMP for WO3 Film with an Addition of Oxidizers

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J Electr Electron Mater 2005;18(1):12-16.
Published online: January 1, 2005
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Planarization Characteristics of CMP for WO3 Film with an Addition of Oxidizers
J Electr Electron Mater. 2005;18(1):12-16.   Published online January 1, 2005
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
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Planarization Characteristics of CMP for WO3 Film with an Addition of Oxidizers
J Electr Electron Mater. 2005;18(1):12-16.   Published online January 1, 2005
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