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Jeoung Yeon Hwang (2)
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Jeoung Yeon Hwang (2)
Chang Il Kim (2)
Dae Shik Seo (2)
Seong Jun Bae (1)
Hong Koo Baik (1)
Yun Seong Chang (1)
Eui Goo Chang (1)
Hong Bay Chung (1)
Duk Yong Ha (1)
Kyo Yong Han (1)
Yong Han Hwang (1)
Yong Min Jo (1)
Jin Hwee Jung (1)
Pil Seung Kang (1)
Myeong Gu Kang (1)
Hyung Boo Kang (1)
Kwang Ho Kim (1)
Dong Pyo Kim (1)
Sang Gi Kim (1)
Young Jin Kim (1)
Hyun Sik Kim (1)
Jun Young Kim (1)
Tae Ho Kim (1)
Jin Woo Kim (1)
Jong Il Kim (1)
Seon Hag Lee (1)
Hae Yon Lee (1)
Dae Kyu Lee (1)
Yun Gun Lee (1)
Hyun Yong Lee (1)
Young Woo Oh (1)
Hwan Sool Oh (1)
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Previous issues
Volume 15(5); May 2002
Fabrication and Properties of MFISFET using SrBi2Ta2O9 / SiN / Si Structures
Kwang Ho Kim
J Korean Inst Electr Electron Mater Eng
2002;15(5):383-387.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.383
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A Study on Etch Characteristics of CeO2 Thin Film in An Ar / CF4 / Cl2 Plasma
Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang
J Korean Inst Electr Electron Mater Eng
2002;15(5):388-392.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.388
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The Etching Characteristics of Polyimide Thin Films using CF4 / O2 Gas Plasma
Pil Seung Kang, Chang Il Kim, Sang Gi Kim
J Korean Inst Electr Electron Mater Eng
2002;15(5):393-397.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.393
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Dry Etching of Flexible Polycarbonate and PMMA in O2/SF6/CH4Discharges
Y.W. Joo, Y.H. Park, H.S. Noh, J.K. Kim, J.W. Lee
Journal of the Korean Vacuum Society.2009; 18(2): 85.
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A Study on the Improvement of the Electrical Stability Versus MgO Additive for Zno Ceramic Varistors
Soon Jin So, Young Jin Kim, Choon Bae Park
J Korean Inst Electr Electron Mater Eng
2002;15(5):398-409.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.398
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The Effects of Additives on Microstructure and Magnetic Properties of Ni0.8Zn0.2Fe2O4
Young Woo Oh, Seon Hag Lee, Hae Yon Lee, Hyun Sik Kim
J Korean Inst Electr Electron Mater Eng
2002;15(5):406-407.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.406
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VCO Oscillation Characteristics by Varying the Length of the MSL of LC Resonator
Dong Hee Rhie, Jin Hwee Jung
J Korean Inst Electr Electron Mater Eng
2002;15(5):412-418.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.412
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28
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Liquid Crystal Alignment Effects using a Diamond - like Carbon Thin Film
Jeoung Yeon Hwang, Yong Min Jo, Dae Shik Seo, Soon Joon Rho, Dae Kyu Lee, Hong Koo Baik
J Korean Inst Electr Electron Mater Eng
2002;15(5):419-422.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.419
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Liquid Crystal Alignment Effects on the Homopolymerized N-(phenyl)maleimide Photopolymer
Jeoung Yeon Hwang, Jun Young Kim, Yun Gun Lee, Dae Shik Seo, Tae Ho Kim
J Korean Inst Electr Electron Mater Eng
2002;15(5):423-428.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.423
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A Study on the Fabrication and Characteristic Analysis of Multiheterostructure White Organic Light Emitting Device
Byeong Gyu Roh, Myeong Gu Kang, Hwan Sool Oh
J Korean Inst Electr Electron Mater Eng
2002;15(5):429-434.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.429
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29
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The Photoluminescence ( PL ) Spectroscopy and the Photo - Darkening ( PD ) Effect of the Amorphous SeGe Thin Films
Jin Woo Kim, Hyun Yong Lee, Hong Bay Chung
J Korean Inst Electr Electron Mater Eng
2002;15(5):435-440.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.435
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The Influence of the Mg - doped p-GaN Layer Activated in the O2 Ambient on the Current - Voltage Characteristics of the GaN - Based Green LEDs
Seong Jun Bae, Chang Joo Youn
J Korean Inst Electr Electron Mater Eng
2002;15(5):441-448.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.441
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31
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Formation of ITO Ohmic Contact to n+-InP for 3 - 5 Optoelectronic Devices
Yong Han Hwang, Kyo Yong Han
J Korean Inst Electr Electron Mater Eng
2002;15(5):449-454.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.449
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36
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High Voltage Engineering : Effect of Annealing on Carbon Nitride Films Prepared by High Voltage Discharge Plasma
Jong Il Kim
J Korean Inst Electr Electron Mater Eng
2002;15(5):455-459.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.455
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High Voltage Engineering : A Study of the Characteristic on the Vacuum Interrupter with Axial Magnetic Field Type using 3 Dimension Finite Element Analysis
Duk Yong Ha, Hyung Boo Kang
J Korean Inst Electr Electron Mater Eng
2002;15(5):460-467.
Published online May 1, 2002
DOI:
https://doi.org/10.4313/JKEM.2002.15.5.460
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30
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