The Etching Characteristics of Polyimide Thin Films using CF4 / O2 Gas Plasma

Pil Seung Kang; Chang Il Kim; Sang Gi Kim

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CF4 / O2 gas 플라즈마를 이용한 폴리이미드 박막의 식각

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The Etching Characteristics of Polyimide Thin Films using CF4 / O2 Gas Plasma

Pil Seung Kang, Chang Il Kim, Sang Gi Kim

J Electr Electron Mater 2002;15(5):393-397.
Published online: May 1, 2002

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The Etching Characteristics of Polyimide Thin Films using CF4 / O2 Gas Plasma

J Electr Electron Mater. 2002;15(5):393-397. Published online May 1, 2002

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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bib — For JabRef, BibDesk, and other BibTeX-specific software

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The Etching Characteristics of Polyimide Thin Films using CF4 / O2 Gas Plasma

J Electr Electron Mater. 2002;15(5):393-397. Published online May 1, 2002

Articles

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CF4 / O2 gas 플라즈마를 이용한 폴리이미드 박막의 식각

The Etching Characteristics of Polyimide Thin Films using CF4 / O2 Gas Plasma

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