A Study on Etch Characteristics of CeO2 Thin Film in An Ar / CF4 / Cl2 Plasma

Yun Seong Chang; Dong Pyo Kim; Chang Il Kim; Eui Goo Chang

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Ar / CF4 / Cl2 플라즈마에 의한 CeO2 박막의 식각 특성 연구

장윤성, 김동표, 김창일, 장의구

A Study on Etch Characteristics of CeO2 Thin Film in An Ar / CF4 / Cl2 Plasma

Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang

J Electr Electron Mater 2002;15(5):388-392.
Published online: May 1, 2002

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A Study on Etch Characteristics of CeO2 Thin Film in An Ar / CF4 / Cl2 Plasma

J Electr Electron Mater. 2002;15(5):388-392. Published online May 1, 2002

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A Study on Etch Characteristics of CeO2 Thin Film in An Ar / CF4 / Cl2 Plasma

J Electr Electron Mater. 2002;15(5):388-392. Published online May 1, 2002

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Ar / CF4 / Cl2 플라즈마에 의한 CeO2 박막의 식각 특성 연구

A Study on Etch Characteristics of CeO2 Thin Film in An Ar / CF4 / Cl2 Plasma

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