Journal of Electrical and Electronic Materials

Study on the Electrical Properties of a-IGZO TFTs Depending on Processing Parameters: Eu Gene Chong, Kyoung Chol Jo, Seung Han Kim, Sang Yeol Lee; J Korean Inst Electr Electron Mater Eng 2010;23(5):349-352. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.349

Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching: Tae Kyung Ha, Jong Chang Woo, Gwan Ha Kim, Chang Il Kim; J Korean Inst Electr Electron Mater Eng 2010;23(5):353-357. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.353

Effect of Pad Thickness on Removal Rate and Within Wafer Non-Uniformity in Oxide CMP: Jae Hyun Bae, Hyun Seop Lee, Jae Hong Park, Hideaki Nishizawa, Masaharu Kinoshita, Hae Do Jeong; J Korean Inst Electr Electron Mater Eng 2010;23(5):358-363. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.358

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Effects of CMP Retaining Ring Material on the Performance of Wafer Polishing
Ki-Won Park, Eun-young Kim, Dong-Sam Park
Journal of the Korean Society of Manufacturing Process Engineers.2020; 19(3): 22. CrossRef
Effects of Insert Materials of Retaining Ring on Polishing Finish in Oxide CMP
Ki-Won Park, Dong-Sam Park
Journal of the Korean Society of Manufacturing Process Engineers.2019; 18(8): 44. CrossRef
Finite Element Analysis on Dynamic Viscoelasticity of CMP Polishing Pad
Byeongjun Pak, Dasol Lee, Seonho Jeong, Hyunjin Kim, Haedo Jeong
Journal of the Korean Society for Precision Engineering.2019; 36(2): 177. CrossRef

The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices: Sung Min Yang, Ju Hyun Oh, Young Seok Bae, Man Young Sung; J Korean Inst Electr Electron Mater Eng 2010;23(5):364-367. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.364

Analysis of a.c. Characteristics in ZnO-Bi2O3-Cr2O3 Varistor using Dielectric Functions: Youn Woo Hong, Hyo Soon Shin, Dong Hun Yeo, Jin Ho Kim; J Korean Inst Electr Electron Mater Eng 2010;23(5):368-373. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.368

Properties of ZnOGa Thin Film Fabricated on Polyimide Substrate by RF Magnetron Sputtering: Seung Beum Park, Jeong Yeon Kim, Byeong Guk Kim, Jong Youb Lim, In Hwan Yeo, Sang Ki Ahn, Soon Yong Kweon, Jae Hwan Park, Dong Gun Lim; J Korean Inst Electr Electron Mater Eng 2010;23(5):374-378. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.374

Piezoelectric Properties of (Na,K)NbO3 Ceramics as a Function of K5.4Cu1.3Ta10O29 Addition: Jung Rae Noh, Ju Hyun Yoo, Yeong Ho Jeong; J Korean Inst Electr Electron Mater Eng 2010;23(5):379-382. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.379

Response Characteristics of Acoustic Emission Sensor according to Partial Discharge Quantities: Yeong Ho Jeong; J Korean Inst Electr Electron Mater Eng 2010;23(5):383-387. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.383

Thin Films and Sensors : A Study on Improvement of FBAR Duplexer for Wireless Systems: Eun Kyu Lee, Hyung Rim Choi; J Korean Inst Electr Electron Mater Eng 2010;23(5):388-396. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.388

Thin Films and Sensors : Application of Si3N4 Thin Film as a Humidity Protection Layer for Organic Light Emitting Diode: Chang Jo Kim, Paik Kyun Shin; J Korean Inst Electr Electron Mater Eng 2010;23(5):397-402. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.397

Diffraction Efficiency Properties of Holographic Gratings by the Reversal Bleached on the Effect of Superadditivity: Chun Woo Lim; J Korean Inst Electr Electron Mater Eng 2010;23(5):403-407. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.403

Detent Torque of Parking Magnet Starting Device Installed in the Single-Phase Switched Reluctance Motor: Jun Ho Kim, Seung Min Lee; J Korean Inst Electr Electron Mater Eng 2010;23(5):408-412. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.408

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A Rotationally Asymmetric Reluctance Machine With Improved Torque Density
Cahya A. Harianto, Scott D. Sudhoff
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High Voltage and Discharge Engineering : Monitoring Technique and Device of Surface Contamination for Line-Post Insulator: Gyung Suk Kil, Dae Won Park, Kwang Seok Jung, Sun Jae Kim, Dong Hoan Seo; J Korean Inst Electr Electron Mater Eng 2010;23(5):413-417. Published online May 1, 2010; DOI: https://doi.org/10.4313/JKEM.2010.23.5.413

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Harmonics Analysis of Leakage Current due to Artificial Contamination of Distribution Arresters
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Analysis of Leakage Current Waveforms for Transmission Line Porcelain Insulators due to ESDD Contamination
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