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Cl2
WHERE t1.sid in(parameter_dbtbl_keyword '%Cl2%') and t1.xml_status <> 99
4
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"Cl2"
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Keywords
Etching (3)
ICP (3)
Au (2)
Cl2/Ar (2)
XPS (2)
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2009 (1)
2008 (1)
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Authors
Chang Il Kim (4)
Dong Pyo Kim (3)
Yun Seong Chang (2)
Eui Goo Chang (2)
Doo Seung Um (2)
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Keywords
Etching (3)
ICP (3)
Au (2)
Cl2/Ar (2)
XPS (2)
ACP (1)
Al2O3 (1)
BCl3/Ar (1)
Cl2 (1)
Cl2/CF4/Ar (1)
Dry etching (1)
Plasma (1)
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TiN (1)
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Chang Il Kim (4)
Dong Pyo Kim (3)
Yun Seong Chang (2)
Eui Goo Chang (2)
Doo Seung Um (2)
Gwan Ha Kim (1)
Su Jae Lee (1)
Sang Hun Song (1)
Jong Chang Woo (1)
Xue Yang (1)
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"Cl2"
Dry Etching of Al2O3 Thin Film by Cl2/Ar Plasma
Xue Yang, Doo Seung Um, Gwan Ha Kim, Sang Hun Song, Chang Il Kim
J Electr Electron Mater
2009;22(12):1005-1008.
Published online December 1, 2009
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Etch Characteristics of TiN Thin Film with Addition Cl2 Gas in BCl3/Ar Plasma
Doo Seung Um, Jong Chang Woo, Dong Pyo Kim, Chang Il Kim
J Electr Electron Mater
2008;21(12):1051-1056.
Published online December 1, 2008
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Etching Characteristics of Gold Thin Films using Inductively Coupled CF4/Cl2/Ar Plasma
Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang
J Electr Electron Mater
2003;16(7):564-568.
Published online July 1, 2003
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12
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Etching Characteristics of Gold Thin Films using Inductively Coupled Cl2/Ar Plasma
Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang, Su Jae Lee
J Electr Electron Mater
2002;15(12):1011-1015.
Published online December 1, 2002
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