Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Page Path

4
results for

"Cl2"

Keywords

Publication year

Authors

"Cl2"

Dry Etching of Al2O3 Thin Film by Cl2/Ar Plasma
Xue Yang, Doo Seung Um, Gwan Ha Kim, Sang Hun Song, Chang Il Kim
J Electr Electron Mater 2009;22(12):1005-1008.   Published online December 1, 2009
  • 10 View
  • 0 Download
Etch Characteristics of TiN Thin Film with Addition Cl2 Gas in BCl3/Ar Plasma
Doo Seung Um, Jong Chang Woo, Dong Pyo Kim, Chang Il Kim
J Electr Electron Mater 2008;21(12):1051-1056.   Published online December 1, 2008
  • 8 View
  • 0 Download
Etching Characteristics of Gold Thin Films using Inductively Coupled CF4/Cl2/Ar Plasma
Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang
J Electr Electron Mater 2003;16(7):564-568.   Published online July 1, 2003
  • 12 View
  • 0 Download
Etching Characteristics of Gold Thin Films using Inductively Coupled Cl2/Ar Plasma
Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang, Su Jae Lee
J Electr Electron Mater 2002;15(12):1011-1015.   Published online December 1, 2002
  • 10 View
  • 0 Download