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BCl3/Ar 플라즈마에 Cl2 가스 첨가에 따른 TiN 박막의 식각 특성

엄두승, 우종창, 김동표, 김창일

Etch Characteristics of TiN Thin Film with Addition Cl2 Gas in BCl3/Ar Plasma

Doo Seung Um, Jong Chang Woo, Dong Pyo Kim, Chang Il Kim
J Electr Electron Mater 2008;21(12):1051-1056.
Published online: December 1, 2008
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Etch Characteristics of TiN Thin Film with Addition Cl2 Gas in BCl3/Ar Plasma
J Electr Electron Mater. 2008;21(12):1051-1056.   Published online December 1, 2008
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Etch Characteristics of TiN Thin Film with Addition Cl2 Gas in BCl3/Ar Plasma
J Electr Electron Mater. 2008;21(12):1051-1056.   Published online December 1, 2008
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