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"Field ring"

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"Field ring"

The Optimal Design of Field Ring for Reliability and Realization of 3.3 kV Power Devices
Ey Goo Kang
J Electr Electron Mater 2017;30(3):148-151.   Published online March 1, 2017
This research concerns field rings for 3.3kV planar gate power insulated-gate bipolar transistors (IGBTs). We design an optimal field ring for a 3.3kV power IGBT and analyze its electrical characteristics according to field ring parameters. Based on this background, we obtained 3.3kV high breakdown voltage and a 2.9V on state voltage drop. To obtain high breakdown voltage, we confirmed that the field ring count was 23, and we obtained optimal parameters. The gap distance between field rings 13㎛ and the field ring width was 5㎛. This design technology will be adapted to field stop IGBTs and super junction IGBTs. The thyristor device for a power conversion switch will be replaced with a super high voltage power IGBT.
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A Study on Field Ring Design of 600 V Super Junction Power MOSFET
Young Sung Hong, Eun Sik Jung, Ey Goo Kang
J Electr Electron Mater 2012;25(4):276-281.   Published online April 1, 2012
Power semiconductor devices are widely used as high voltage applications to inverters and motor drivers, etc. The blocking voltage is one of the most important parameters for power semiconductor devices. Generally most of field effect concentrations shows on the edge of power devices. Can be improve the breakdown characteristic using edge termination technology. In this paper, considering the variables that affect the breakdown voltage and optimization of parameters result for 600 V Super Junction MOSFET Field ring.
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A Study on the Field Ring of High Voltage Characteristics Improve for the Power Semiconductor
Tae Jin Nam, Eun Sik Jung, Sung Jong Kim, Hun Suk Jung, Ey Goo Kang
J Electr Electron Mater 2012;25(3):165-169.   Published online March 1, 2012
Power semiconductor devices are widely used as high voltage applications to inverters and motor drivers, etc. The blocking voltage is one of the most important parameters for power semiconductor devices. And cause of junction curvature effects, the breakdown voltage of the device edge and device unit cells was found to be lower than the ``ideal`` breakdown voltage limited by the semi-infinite junction profile. In this paper, Propose the methods for field ring design by DOE (Design of Experimentation). So The field ring can be improve for breakdown voltage and optimization.
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The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices
Sung Min Yang, Ju Hyun Oh, Young Seok Bae, Man Young Sung
J Electr Electron Mater 2010;23(5):364-367.   Published online May 1, 2010
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A Study on Electrical Characteristics of Trench Field Ring for Breakdown Characteristics
Ey Goo Kang, Beum Jun Kim, Young Hun Lee
J Electr Electron Mater 2010;23(1):1-5.   Published online January 1, 2010
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