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Metal CMP
WHERE t1.sid in(parameter_dbtbl_keyword '%Metal CMP%') and t1.xml_status <> 99
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"Metal CMP"
Effect of Cerium Ammonium Nitrate and Alumina Abrasive Particles on Polishing Behavior in Ruthenium Chemical Mechanical Planarization
J Electr Electron Mater
2005;18(9):803-809.
Published online September 1, 2005
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Application of Herd Porous Pad in Metal CMP Process
Sang Yong Kim, Nam Hoon Kim, In Pyo Kim, Eui Goo Chang
J Electr Electron Mater
2003;16(5):385-389.
Published online May 1, 2003
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