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"Thin wafer"

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"Thin wafer"

Effect of Pad Thickness on Removal Rate and Within Wafer Non-Uniformity in Oxide CMP
Jae Hyun Bae, Hyun Seop Lee, Jae Hong Park, Hideaki Nishizawa, Masaharu Kinoshita, Hae Do Jeong
J Electr Electron Mater 2010;23(5):358-363.   Published online May 1, 2010
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Effect of Pad Surface Characteristics on Within Wafer Non-uniformity in CMP
J Electr Electron Mater 2006;19(4):309-313.   Published online April 1, 2006
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A Study on the Within Wafer Non-uniformity of Oxide Film in CMP
J Electr Electron Mater 2005;18(6):521-526.   Published online June 1, 2005
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Design and Fabrication of Film Bulk Acoustic Resonator for Flexible Microsystems
Yu Li Kang, Yong Gug Kim, Su Won Kim, Byeong Gwon Ju
J Electr Electron Mater 2003;16(12s):1224-1231.
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Wafer Level Packaging of RF-MEMS Devices with Vertical Feed-through
Yong Gug Kim, Yun Gwon Park, Jae Gyeong Kim, Byeong Gwon Ju
J Electr Electron Mater 2003;16(12s):1237-1241.
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