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자장강회도니 유도결합 플라즈마를 이용한 ( Ba , Sr ) TiO3 박막의 식각 특성 연구

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The Etching Characteristics of ( Ba , Sr ) TiO3 Thin Films Using Magnetically Enhanced Inductively Coupled Plasma

Byung Jun Min, Chang Il Kim
J Electr Electron Mater 2000;13(12):996-1002.
Published online: December 1, 2000
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The Etching Characteristics of ( Ba , Sr ) TiO3 Thin Films Using Magnetically Enhanced Inductively Coupled Plasma
J Electr Electron Mater. 2000;13(12):996-1002.   Published online December 1, 2000
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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The Etching Characteristics of ( Ba , Sr ) TiO3 Thin Films Using Magnetically Enhanced Inductively Coupled Plasma
J Electr Electron Mater. 2000;13(12):996-1002.   Published online December 1, 2000
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