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CF4 / Ar 플라즈마 내 Cl2 첨가에 의한 SrBi2Ta2O9 박막의 식각 특성

김창일, 김동표, 이원재, 유병곤, 김태형, 장의구

Etching Characteristics of SrBi2Ta2O9 Thin Film with Adding Cl2 into CF4 / Ar Plasma

Chang Il Kim, Dong Pyo Kim, Won Jae Lee, Byung Gon Yu, Tae Hyung Kim, Eui Goo Chang
J Electr Electron Mater 2001;14(9):714-719.
Published online: September 1, 2001
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Etching Characteristics of SrBi2Ta2O9 Thin Film with Adding Cl2 into CF4 / Ar Plasma
J Electr Electron Mater. 2001;14(9):714-719.   Published online September 1, 2001
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Etching Characteristics of SrBi2Ta2O9 Thin Film with Adding Cl2 into CF4 / Ar Plasma
J Electr Electron Mater. 2001;14(9):714-719.   Published online September 1, 2001
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