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Via Contact 형성을 위한 산화막 식각공정의 신경망 모델

박종문, 권성구, 박건식, 유성욱, 배윤규, 김병환, 권광호

Neural Network Models of Oxide Film Etch Process for Via Contact Formation

Jong Moon Park, Sung Ku Kwon, Gun Sik Park, Seong Wook Yoo, Yoon Kyu Bae, Byung Whan Kim, Kwang Ho Kwon
J Korean Inst Electr Electron Mater Eng 2002;15(1):7-14.
Published online: January 1, 2002
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Neural Network Models of Oxide Film Etch Process for Via Contact Formation
J Korean Inst Electr Electron Mater Eng. 2002;15(1):7-14.   Published online January 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.1.007
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Include:
Neural Network Models of Oxide Film Etch Process for Via Contact Formation
J Korean Inst Electr Electron Mater Eng. 2002;15(1):7-14.   Published online January 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.1.007
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