Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

Gwan Ha Kim; Kyoung Tae Kim; Dong Pyo Kim; Chang Il Kim

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유도결합 플라즈마를 이용한 PST 박막의 식각 특성

김관하, 김경태, 김동표, 김창일

Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

Gwan Ha Kim, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim

J Electr Electron Mater 2003;16(4):286-291.
Published online: April 1, 2003

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Keywords: PST, Etching, ICP, CF4/Ar, XPS

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Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

J Electr Electron Mater. 2003;16(4):286-291. Published online April 1, 2003

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

J Electr Electron Mater. 2003;16(4):286-291. Published online April 1, 2003

Articles

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유도결합 플라즈마를 이용한 PST 박막의 식각 특성

Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

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